发明名称 COMPOSITE FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To improve the reliability in the elevating/lowering operation of a substrate in a device for perming a film deposition by holding the film-depositing surface of the substrate downward so as to be almost vertical. SOLUTION: The inner wall 35a of an elevating/lowering part in a clamp block 31, which holds a part of a substrate adopter 2 fixed with the substrate S and elevates/lowers, is composed of a single member. As a result, a level difference caused by the joining of a constituting member does not occur in the inner wall 35a of the elevating/lowering part, and, even if a gap between the inner wall 35a of the elevating/lowering part and the clamp block 31 is reduced, the phenomenon that a part of the clamp block 31 or the substrate adaptor 2 held to the clamp block 31 is caught in a level difference can be prevented. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008280617(A) 申请公布日期 2008.11.20
申请号 JP20080195954 申请日期 2008.07.30
申请人 SHIMADZU CORP 发明人 KITAHARA MASARU
分类号 C23C16/458;C23C14/50;H01L21/683 主分类号 C23C16/458
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