| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer and a resin composition for an upper layer film for immersion exposure that have sufficient transmissibility within the wavelength range of a radiation, can form a protecting film on a photoresist film without causing intermixing with the photoresist film, exhibits sufficient oil repellence to hardly cause liquid remaining on the film on high-speed scanning and can form an upper layer film having a sufficiently high refractive index corresponding to high NA exposure. <P>SOLUTION: The polymer for the upper layer film can form a film having a contact angle of at least 65° and less than 90° with trans-decahydronaphthalene, 1,1-bicylcohexyl and exo-tetrahydrodicyclopentadiene and having a refractive index of at least 1.6 and at most 1.8 at 193 nm and has a weight-average molecular weight of 2,000-100,000. The polymer for the upper layer film comprises a recurring unit having a fluorine atom-bearing group in its side chain and a recurring unit having a sulfur atom-bearing group in its side chain. <P>COPYRIGHT: (C)2009,JPO&INPIT |
