| 摘要 |
<p>An exposure apparatus (EX) includes an optical system (PL) that irradiates a first exposure light (EL1) with a first wavelength onto a first exposure field (AR1) and irradiates a second exposure light (EL2) with a second wavelength different from the first wavelength onto a second exposure field (AR2), a predetermined field (S) on the substrate (P) being multiply exposed with an image of a first pattern (PA1) formed by the irradiation of the first exposure light (EL1) onto the first exposure field (AR1) and with an image of a second pattern (PA2) formed by the irradiation of the second exposure light (EL2) onto the second exposure field (AR2).</p> |
