| 摘要 |
An exposure apparatus that includes a first optical system (PL) having an optical element (20) that separates incident exposure light (L1) into a first exposure light (L11) and a second exposure light (L12) and emits the first exposure light (L11) in a first direction and emits the second exposure light (L12) in a second direction that differs from the first direction; and a second optical system (HL) that irradiates the second exposure light (L12) that is emitted from the optical element (20) in the second direction onto the substrate (P) together with the first exposure light (L11) that is emitted in the first direction.
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