发明名称 Positive-working photosensitive composition and pattern forming method using the same
摘要 A positive-working photosensitive composition that includes (A) a resin containing repeating units having diamantane structures and capable of decomposing under action of an acid to increase solubility in an alkali developer, (B) a compound capable of generating a specific organic acid upon irradiation with an actinic ray or radiation, and (C) a solvent.
申请公布号 US7465528(B2) 申请公布日期 2008.12.16
申请号 US20060581407 申请日期 2006.10.17
申请人 FUJIFILM CORPORATION 发明人 NISHIYAMA FUMIYUKI;KODAMA KUNIHIKO
分类号 G03F7/039 主分类号 G03F7/039
代理机构 代理人
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