| 摘要 |
To reduce a stress change generated in the production processes of a transfer mask to improve a position accuracy of a mask pattern. A production method of a transfer mask characterized by further including, in the production processes of the transfer mask, a step of forming on said thin film layer a stress control layer that cancels a stress change of the thin film layer generated in the production processes of the mask, prior to formation of said resist layer, and a step of carrying out etching using said resist pattern as an etching mask. |
