METHOD OF MAKING HCD GAS HARMLESS AND APPARATUS THEREFOR

摘要

A discharge gas (L) containing hexachlorodisilicon is introduced into a reaction treatment region (K) without moistening the gas. An oxygenous gas (G) containing a slight amount of water is supplied to the reaction treatment region (K) which is kept at a decomposition temperature of hexachlorodisilicon to thereby decompose the hexachlorodisilicon into hydrochloric acid, silicon dioxide, and water. Thus, the treatment of the discharge gas containing hexachlorodisilicon is safely conducted without generating silicoxalic acid or chlorine. ® KIPO & WIPO 2009