| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaporation source for vacuum vapor deposition, which can form a film with a film thickness exceeding several hundred micrometers, can highly uniformly and quickly melt a large amount of a film-forming material, and can prevent a defect due to bumping and the like, and to provide a vacuum vapor-deposition apparatus using the evaporation source. SOLUTION: In order to solve the problem, the evaporation source which vaporizes a film-forming material by heating/melting the material comprises: a plurality of evaporation chambers for heating/melting the film-forming material; and a shielding member which is arranged in the upper part of the evaporation chambers, and has only one aperture for passing the vapor of the film-forming material formed therein. COPYRIGHT: (C)2009,JPO&INPIT
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