发明名称 COMPOSITION OF POLISHING FLUID FOR HARD DISK SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a composition of a polishing fluid for a hard disk substrate, which reduces the cut-in and roll-off of abrasive grains without lowering polishing speed, and also to provide a method of manufacturing a hard disk substrate using the composition. <P>SOLUTION: This composition of a polishing fluid contains: aluminum oxide particles in which the volumetrically medium particle size of secondary particles is 0.1-0.7μm, the content of the particles with particle size more than 1μm is equal to or less than 0.2 wt%; and a copolymer having the constitution unit expressed by the expression (I), and one or more constitution units expressed by the expression (II) and/or the expression (III). In the expressions, AO represents oxy-alkylene group, and X represents O or NH. As a monomer for forming the constitution unit in the expression (I), methoxypolyethylene glycol methacrylate or the like is cited. As a monomer for forming the constitution unit in the expression (II), stearylmetacrylate or the like is cited. As a monomer for forming the constitution unit in the expression (III), polypropyrene glycol methacrylate or the like is cited. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008296318(A) 申请公布日期 2008.12.11
申请号 JP20070144040 申请日期 2007.05.30
申请人 KAO CORP 发明人 SUZUKI MASAHIKO;SUENAGA KENICHI
分类号 B24B37/00;C09K3/14;G11B5/84 主分类号 B24B37/00
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