| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor substrate cleaning method capable of effectively removing fine particles adsorbed to the surface of a semiconductor substrate. SOLUTION: This semiconductor substrate cleaning method cleans the semiconductor substrate 1 using a cleaning liquid which is either an acidic solution wherein a gas is dissolved to a saturated concentration and is a solution for making the zeta-potentials of the semiconductor substrate and adsorbed particles minus by a surfactant being added therein or an alkaline solution wherein a gas is dissolved to a saturated concentration and is a solution with a pH of≥9, and which includes the bubbles of the gas. COPYRIGHT: (C)2009,JPO&INPIT
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