发明名称 IN SITU CLEANING OF CVD SYSTEM EXHAUST
摘要 Embodiments of the invention relate to methods and apparatus are disclosed for forming films using CVD. One or more method and apparatus embodiments include preventing the formation of bonds and/or breaking bonds that permit polymers to form in an exhaust line of a CVD apparatus.
申请公布号 WO2007137035(A3) 申请公布日期 2008.12.11
申请号 WO2007US68948 申请日期 2007.05.15
申请人 APPLIED MATERIALS, INC.;CARLSON, DAVID, K. 发明人 CARLSON, DAVID, K.
分类号 C23C16/44;C23C16/48 主分类号 C23C16/44
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