发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To accurately position a substrate during exposure by accurately correcting the change of the position of an XY direction of a chuck due to rotation. <P>SOLUTION: A moving stage mounts the chuck to move the chuck in the XY direction and to rotate it in a &theta; direction so as to position the substrate during exposure. A laser displacement measuring controller 40 detects the change of the position in the XY direction of the chuck due to rotation from a measured result of laser displacement measuring device 42, 43. A main controller 70 performs: calculating the change of the position in the XY direction of the chuck due to rotation when rotation center of the moving stage matches a center of the chuck; finding an amount of displacement from the center of the chuck of the rotation center of the moving stage from the calculated result and the detected result of the laser displacement measuring controller 40; and correcting the position in the XY direction of the chuck based on the obtained amount of the displacement. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008298906(A) 申请公布日期 2008.12.11
申请号 JP20070142799 申请日期 2007.05.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 HARA YASUHIKO;TOIKAWA HIROSHI
分类号 G03F7/20;G02F1/13;G02F1/1368;H01L21/027 主分类号 G03F7/20
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