SEMICONDUCTOR DEVICE AND INSPECTION METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a structure of a semiconductor device and inspection method thereof, for efficiently detecting a failure of the semiconductor device by a measurement and management of various kinds of characteristic values of the semiconductor device. SOLUTION: The semiconductor device is provided with: a plurality of capacitors 40 which are arranged in a matrix form in an array area of a semiconductor substrate and have lower electrodes 34, dielectric films 36 and upper electrodes 38 respectively; wirings 76 connected to the lower electrodes 34 of a part of capacitors among the plurality of capacitors 40, which is formed on a part of areas in the array area; wirings 72a connected to the upper electrodes 38 of a part of capacitors; an electrode 78 for measurement electrically connected to the lower electrodes 34 of a part of capacitors through the wirings 76; and an electrode 74a for measurement electrically connected to the upper electrodes 38 of a part of capacitors through the wirings 72a. COPYRIGHT: (C)2009,JPO&INPIT