发明名称 ELECTRONIC SYSTEM WITH VERTICAL INTERMETALLIC COMPOUND
摘要 An electronic system is provided including forming a substrate having a contact, forming a conductive structure over the contact, mounting an electrical device having an external interconnect over the conductive structure, and forming a conductive protrusion from the conductive structure in the external interconnect.
申请公布号 US2008303142(A1) 申请公布日期 2008.12.11
申请号 US20070758635 申请日期 2007.06.05
申请人 KIM BAEYONG;CHOI BONGSUK;KIM OH HAN 发明人 KIM BAEYONG;CHOI BONGSUK;KIM OH HAN
分类号 H01L23/48;H01L21/60 主分类号 H01L23/48
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