发明名称 RESIN COMPOSITION FOR ABSORBING CATALYSTS IN PREPARING ELECTRO-MAGNETIC SHIELDING LAYER, METHOD FOR FORMING METALLIC PATTEN USING THE SAME AND METALLIC PATTERN FORMED THEREBY
摘要 A resin composition for absorbing catalysts is provided to excellent pattern characteristic and to facilitate the adsorption of a catalytic metal ion by forming metal patterns. A resin composition for absorbing catalysts comprises (a) a copolymer resin of a maleimide monomer having fat-soluble functional group to nitrogen and a monomer having carboxy group; (b) a polyfunctional monomer having ethylenically unsaturated bond; (c) a photoinitiator; and (d) an organic solvent. The carboxylate group-containing monomer is selected from a group consisting of acrylic acid, methacrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic acid, isoprenesulfonic acid, styrene sulfonic acid and 5- norbornene -2- carboxylic acid. The maleimide monomer having the fat-soluble functional group to the nitrogen is selected from a group consisting of N-ethylmaleimide, N- propylmaleimide, N- methoxycarbonylmaleimide, N- furfuryl maleimide, N- cyclohexylmaleimide, N-butylmaleimide, 2,5- dioxo -3- pyrroline -1- cirque heat amide, 3,4- dichloro methyl - pyrrole -2,5- dyon, N- benzylmaleimide, N-phenylmaleimide, 3- methyl -N- phenylmaleimide, N -(ortho - toil) -N- phenylmaleimide, N -(4- fluorphenyl) maleimide, N -(2,6- seil) maleimide, 3- chloro- 1- phenyl - pyrol -2,5- dyon, N -(2- chlorophenyl) - maleimide, N -(1- naphthalyl) - maleimide and 1 -(2- trifle raw fistula methyl - phenyl) - pyrrole -2,5- dyon.
申请公布号 KR20080107165(A) 申请公布日期 2008.12.10
申请号 KR20070055137 申请日期 2007.06.05
申请人 LG CHEM. LTD. 发明人 KO, MIN JIN;KIM, MIN KYOUN;ROH, JEONG IM;LEE, SANG CHUL
分类号 C08L31/00;C08L23/04;C08L79/08 主分类号 C08L31/00
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