发明名称 ION IMPLANTING DEVICE, AND METHOD FOR ADJUSTMENT OF UNIFORMITY OF THE ION BEAM
摘要 PROBLEM TO BE SOLVED: To uniformize a beam current of an ion beam in a short time by an automatic control. SOLUTION: A plurality of beam current measuring instruments 16 is divided into a plurality of groups. Current amount flowing into respective filaments 3 is arbitrarily made to be varied, and current variation amount of each group at that time is obtained respectively, and the current flowing into each filament 3 is controlled based on each variation amount so that the current amount of each group approaches a preset value. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008293724(A) 申请公布日期 2008.12.04
申请号 JP20070136169 申请日期 2007.05.23
申请人 IHI CORP 发明人 YAMANAKA YOSUKE;SHIOTANI TETSUO;ODAGIRI KIYOYUKI;SHIKAYAMA HIROYUKI;AYAME YOSHIHIKO
分类号 H01J37/317;H01J37/04 主分类号 H01J37/317
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