发明名称 Method for recycling used sputtering target
摘要 A method for recycling a used sputtering target is provided, including the steps of: (1) cleaning, (2) pulverization, (3) dissolution, (4) filtering, (5) peptization, (6) neutralization and precipitation, (7) rinsing and filtering, (8) drying, and (9) calcination; through the steps above, which can then be recycling used sputtering target to recover the constituent components of the ITO targets.
申请公布号 US2008299035(A1) 申请公布日期 2008.12.04
申请号 US20070806250 申请日期 2007.05.30
申请人 CHENG LOONG CORPORATION 发明人 LU HSIN-CHUN;HSIEH CHIH-MING;CHEN YI-CHIEH;SHIAO CHERNG-YUAN;HSU KUO-SHU;SYU NAI-SHENG
分类号 C01G15/00;C01G19/02 主分类号 C01G15/00
代理机构 代理人
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