EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING DEVICE, CLEANING METHOD AND EXPOSURE METHOD

摘要

Disclosed is an exposure apparatus (EX) wherein a substrate (P) is exposed to an exposure light (EL) through a liquid (LQ) for exposure. This exposure apparatus (EX) comprises an optical device (11) emitting an exposure light, a stage (2, 32) movable on the light emission side of the optical device (11), a certain member (150 (C)) mounted on the stage, and a vibration generator (10) which applies vibrations to a liquid in an immersion space, which is formed on the certain member, by vibrating the certain member.Also disclosed is a cleaning device used for an liquid immersion exposure apparatus. In this exposure apparatus (EX), performance deterioration due to contamination can be suppressed.