发明名称 METHODS FOR MANUFACTURING AND RECLAIMING ELECTRODE FOR PLASMA PROCESSING APPARATUS
摘要 <p>A plurality of reference holes are formed on a surface of a first substrate made of a first material, and a plurality of columnar members are fitted in the reference holes, respectively, so that at least a part of each columnar member protrudes from the surface of the first substrate. Then, on the surface of the first substrate, an electrode surface layer made of a second material is formed so that each end portion of the columnar member is exposed from the surface, and then the columnar members are removed. Thus, a substrate-like electrode, which has at least an electrode surface layer provided with a through hole having a cross-section that corresponds to the cross-section shape of the protruding portion of the columnar member, is provided.</p>
申请公布号 WO2008146918(A1) 申请公布日期 2008.12.04
申请号 WO2008JP60043 申请日期 2008.05.30
申请人 MITSUI ENGINEERING & SHIPBUILDING CO., LTD.;ADMAP INC;KAWAHARA, FUMITOMO 发明人 KAWAHARA, FUMITOMO
分类号 H01L21/3065;C23C16/509;H05H1/46 主分类号 H01L21/3065
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