| 摘要 |
A device and a method for cleaning a large size substrate are provided to improve the cleaning efficiency with small amount of cleaning water without using expensive nozzle. A washing solution receiving part(10) has a plurality of washing solution outlets which is tightly formed in a bottom surface which faces the washed surface of substrate while including the space in which the washing solution is adopted. An axis of vibration(12) is installed at both side parts of the washing solution receiving part. The washing solution is supplied with high pressure from the washing solution tank(30) by the means like a pump. |
