摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment device etc., capable of maintaining in-plane uniformity of a heat treatment between substrates by carrying out the heat treatment while a heating plate and the substrates are held in parallel. SOLUTION: A heating chamber 3 having a substrate carrying-in opening 31 is formed on a flank of the heat treatment device 1, and the heating plates 36 and 37 for heat-treating a substrate W are provided in parallel above and below the heating chamber 3. A substrate carrying means 5 carries the substrate W to a heat treatment position in the heating chamber 3 and holds it, and heating plate tilt detecting means 2A to 2E, and 71 detect a tilt between the heating plates 36 and 37. Alarm means 71 and 72 generate an alarm when the detection results exceed a predetermined value. COPYRIGHT: (C)2009,JPO&INPIT
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