| 摘要 |
PROBLEM TO BE SOLVED: To swiftly perform control to an objective film deposition rate by all evaporation sources in a vapor deposition technique for evaporating vapor deposition materials from a plurality of evaporation sources. SOLUTION: A vapor deposition system is provided with: a plurality of pods P1 to P3 storing vapor deposition materials M; and a plurality of temperature control parts 11 to 13 respectively controlling the coating film thickness of the vapor deposition materials M evaporated from the plurality of pods P1 to P3. Upon the temperature control of one pod by one temperature control part among the plurality of temperature control parts 11 to 13, temperature control reflecting the degree of influence to the region in charge of one pod for the vapor deposition materials evaporated from the other pods is performed. COPYRIGHT: (C)2009,JPO&INPIT
|
