| 摘要 |
PROBLEM TO BE SOLVED: To maintain the surface smoothness of a resin substrate, to achieve high and uniform deposition strength of a plated film, and to shorten the ozone treatment time. SOLUTION: A resin substrate is treated with a first ozone solution having the high activation rate, and after that, the resin substrate is treated with a second ozone solution having the activation rate lower than that of the first ozone solution. The first ozone solution easily erodes the resin substrate, and easily forms a modifying layer even when organic stain is deposited on its surface. By the subsequent treatment with the second ozone solution, unevenness is averaged, the surface smoothness is enhanced, and variance of local erosion is averaged thereby. COPYRIGHT: (C)2009,JPO&INPIT
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