发明名称 |
SIOX:SI SPUTTERING TARGETS AND METHOD OF MAKING AND USING SUCH TARGETS |
摘要 |
Silicon oxide and electrically conductive doped silicon materials are joined in a protective environment to yield a composite SiOx:Si material that exhibits the properties of SiOx, and yet is electrically conductive due to the presence of the Si. Such a composite material finds use as a target for DC and/or AC sputtering processes to produce silicon oxide thin films for touch-screen applications, barrier thin films in LCD displays and optical thin films used in a wide variety of applications. |
申请公布号 |
EP1929063(A4) |
申请公布日期 |
2008.12.03 |
申请号 |
EP20060801633 |
申请日期 |
2006.08.11 |
申请人 |
WINTEK ELECTRO-OPTICS CORPORATION |
发明人 |
STEVENSON, DAVID, E.;ZHOU, LI, Q. |
分类号 |
C23C14/00;C23C14/10;C23C14/14;C23C14/34;H01L21/31 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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