发明名称 |
Semiconductor device having oxide semiconductor layer and manufacturing method thereof |
摘要 |
<p>The invention provides an active matrix display device comprising a pixel portion including a thin film transistor having a multi-gate structure, the thin film transistor including a first gate electrode and a second gate electrode over a substrate wherein the first gate electrode and the second gate electrode are connected to each other; an insulating film over the first gate electrode and the second gate electrode; and an oxide semiconductor film over the first gate electrode and the second gate electrode with the insulating film interposed there between; a source electrode and a drain electrode formed on the oxide semiconductor film; and a pixel electrode electrically connected to one of the source electrode and the drain electrode; wherein each of the source electrode and the drain electrode comprises a titanium film formed on the oxide semiconductor film.</p> |
申请公布号 |
EP1998373(A2) |
申请公布日期 |
2008.12.03 |
申请号 |
EP20080016225 |
申请日期 |
2006.09.12 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO, LTD. |
发明人 |
AKIMOTO, KENGO;HONDA, TATSUYA;SONE, NORIHITO |
分类号 |
H01L29/786;G02F1/1368;H01L21/20;H01L21/336;H01L21/77;H01L27/12;H01L51/50 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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