发明名称 Semiconductor device having oxide semiconductor layer and manufacturing method thereof
摘要 <p>The invention provides an active matrix display device comprising a pixel portion including a thin film transistor having a multi-gate structure, the thin film transistor including a first gate electrode and a second gate electrode over a substrate wherein the first gate electrode and the second gate electrode are connected to each other; an insulating film over the first gate electrode and the second gate electrode; and an oxide semiconductor film over the first gate electrode and the second gate electrode with the insulating film interposed there between; a source electrode and a drain electrode formed on the oxide semiconductor film; and a pixel electrode electrically connected to one of the source electrode and the drain electrode; wherein each of the source electrode and the drain electrode comprises a titanium film formed on the oxide semiconductor film.</p>
申请公布号 EP1998373(A2) 申请公布日期 2008.12.03
申请号 EP20080016225 申请日期 2006.09.12
申请人 SEMICONDUCTOR ENERGY LABORATORY CO, LTD. 发明人 AKIMOTO, KENGO;HONDA, TATSUYA;SONE, NORIHITO
分类号 H01L29/786;G02F1/1368;H01L21/20;H01L21/336;H01L21/77;H01L27/12;H01L51/50 主分类号 H01L29/786
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