| 摘要 |
This invention provides a photosensitive composition, which can simultaneously realize excellent storage stability and high sensitivity and can form a permanent pattern such as a protective film or an insulating film with high definition in an efficient manner, a photosensitive film, a method for permanent pattern formation using the photosensitive composition, and a printed board comprising a permanent pattern formed by the method for permanent pattern formation. In a preferred embodiment, the photosensitive composition satisfies a relationship of 0.5 < T2/T1 < 3 wherein T1 represents a time (shortest development time) necessary for removing an unexposed part of a photosensitive composition stacked on a base with a developing solution after stacking of a photosensitive composition containing at least a binder, a polymerizable compound, a photopolymerization initiator, and a heat crosslinking agent onto a base and standing of the stacked photosensitive composition at 25‹C in a dark place for 20 min; and T2 represents a time (shortest development time) necessary for removing an unexposed part of the photosensitive composition stacked on the base with a developing solution after standing of the stacked photosensitive composition at 40‹C in a dark place for 72 hr. ® KIPO & WIPO 2009 |
