发明名称 MULTI-STACK FERROELECTRIC POLYMER MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 <p>Multi-Stack Ferroelectric Polymer Memory Device and Method for Manufacturing Same A memory device and method for manufacturing the memory device, the memory device including a first electrode, a first ferroelectric polymer layer over the first electrode, a second electrode over the first ferroelectric polymer layer, a second ferroelectric polymer layer over the second electrode, a third electrode over the second ferroelectric polymer layer, and a protective layer between the first and second ferroelectric polymer layers. The first, second and third electrodes and the first and second ferroelectric polymer layers define first and second ferroelectric capacitor structures, the second electrode being common to the first and second ferroelectric capacitor structures.</p>
申请公布号 SG147341(A1) 申请公布日期 2008.11.28
申请号 SG20070030505 申请日期 2007.05.03
申请人 SONY CORPORATION 发明人 BHANGALE SUNIL MADHUKAR;ISHIDA TAKEHISA
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