发明名称 Exposure apparatus and method for manufacturing device
摘要 An immersion exposure apparatus includes an optical member, a supply outlet that supplies a liquid to a space between an upper surface of the optical member and a movable object, and an annular member at least a portion of which is arranged around the optical member, the space between the upper surface of the optical member and the object being filled with the liquid.
申请公布号 US2008291410(A1) 申请公布日期 2008.11.27
申请号 US20080219835 申请日期 2008.07.29
申请人 发明人 HARA HIDEAKI
分类号 G03B27/42;G03B27/52;G03F7/20 主分类号 G03B27/42
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