发明名称 METHOD OF PRODUCING OPTICAL COMPONENT OF SYNTHETIC QUARTZ GLASS WITH ENHANCED RADIATION RESISTANCE, AND BLANK FOR PRODUCING THE COMPONENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an optical component of synthetic quartz glass optimized with respect to compaction and central birefringence. <P>SOLUTION: The production method for an optical component of synthetic quartz glass includes subjecting a quartz glass blank to a multistage annealing treatment comprising the processes of: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1,130°C and 1,240°C; (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1,100°C, a fictive temperature with a high mean value of 1,100°C or more being reached in the quartz glass; and (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950°C and 1,100°C such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50°C lower than the high mean value of the fictive temperature according to the process (b). <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008285400(A) 申请公布日期 2008.11.27
申请号 JP20080100081 申请日期 2008.04.08
申请人 SHINETSU QUARTZ PROD CO LTD;HERAEUS QUARZGLAS GMBH & CO KG 发明人 KUEHN BODO;KAISER STEFFEN;KASSUBE DENIS;MERGET KERSTIN
分类号 C03B20/00;G03F1/14;H01L21/027 主分类号 C03B20/00
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