发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor device and a method for manufacturing the same are disclosed. The semiconductor device suitable for preventing a threshold voltage of a recess gate from decreasing due to a voltage of an adjacent storage node comprises a semiconductor substrate having an active region which includes a gate area and a storage node contact area and is recess in the gate area; a device isolation structure formed in the semiconductor substrate to define the active region and having a shield layer therein; a recess gate formed in the gate area of the semiconductor substrate; and a storage node formed to be connected with the storage node contact area of the active region.
申请公布号 US2008290390(A1) 申请公布日期 2008.11.27
申请号 US20070852926 申请日期 2007.09.10
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHA SEON YONG
分类号 H01L29/94;H01L21/339;H01L27/108;H01L27/148;H01L29/76;H01L31/119 主分类号 H01L29/94
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