发明名称 |
Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device |
摘要 |
Target 1 that is arranged in the disc direction is sprayed from nozzle 2 that has a slit-shaped aperture. Target 1 is conveyed on a gas stream. He gas is used in this example. Nozzle 2 may be vibrated by a piezo apparatus to spray disc-shaped target 1 . Target 1 that is sprayed from nozzle 2 reaches the irradiation position of laser light with its direction unchanged since the exterior of nozzle 2 is maintained in a high vacuum. Synchronized with delivery of target 1 , pulse laser light 5 from Nd:YAG light source 4 is focused by lens 3 and irradiated onto target 1 . The spot diameter of the laser is the same 1 mm diameter as that of target 1 . The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.
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申请公布号 |
US7456417(B2) |
申请公布日期 |
2008.11.25 |
申请号 |
US20060329116 |
申请日期 |
2006.01.11 |
申请人 |
NIKON CORPORATION |
发明人 |
MURAKAMI KATSUHIKO;INOUE HIDEYA |
分类号 |
G21G4/00;G01J3/10;G01N21/64 |
主分类号 |
G21G4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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