<p>The photolithography equipment and the method are provided to reduce the production cost by making the change over between the stand-alone type mode and the inline mode facilitated. The photolithography equipment and the method comprises the process module(200) including the coating module(220) and the developer module(240); the first transport module(120) loading and unloading the substrate in the coating module; the second transport module(300) loading and unloading the substrate in the developer module; the coating unit performing the application progress; the develop unit performing the photolithography process and installed at the developer module. The first transport module is posted at one side of the process module. The second transport module is installed at the other side of the process module facing the first transport module.</p>
