| 摘要 |
<p>A manufacturing method of blank-mask is provided to suppress contaminations caused from the external environment by coating a nano inorganic material-polymer composite layer to a blank-mask. A blank-mask comprises a transparent quartz substrate(110); mask layers(120,130) formed on the substrate; and a nano inorganic material-polymer composite layer(200) which is coated on the surface of a mask layer, absorbs the residual contaminated materials(303) remaining on the surface of the mask layer, and protects the surface of the mask layer from the external contamination(301).</p> |
