发明名称 SYSTEM FOR SUBSTRATE PROCESSING
摘要 A system for processing a substrate is provided to increase its productivity by reducing the conveying time of a substrate and to minimize its device installment costs by reducing an area and width of a system. A substrate processing system includes: a process chamber(200) which has a first substrate entrance; substrate supporters(210) which are installed at the process chamber; and a first conveying apparatus which is placed at the process chamber and conveys a substrate to the substrate supporter. The substrate supporters are arranged radially about the center of the process chamber.
申请公布号 KR20080101319(A) 申请公布日期 2008.11.21
申请号 KR20070047923 申请日期 2007.05.17
申请人 WI, SOON IM 发明人 WI, SOON IM
分类号 H01L21/02 主分类号 H01L21/02
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