| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus which can uniformly treat a whole substrate in its vacuum vessel. SOLUTION: The vacuum treatment apparatus which mounts and holds a substrate 1 in the inside of a concave part of a substrate holder 2 sets a difference t2 between the heights of the surface of the substrate holder 2 and the surface to be treated of the substrate 1 at 0.2 mm or less, and the distance t1 between the side face of the substrate 1 and the inner surface of the concave part of the substrate holder 2 at 5 mm or less. COPYRIGHT: (C)2009,JPO&INPIT
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