SEMICONDUCTOR ELEMENT, AND METHOD OF MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor element and a manufacturing method thereof.

SOLUTION: The semiconductor element comprises a main pattern formed on a substrate, a first dummy pattern made in the direction parallel to the first main pattern on the layer where the first main pattern is formed. Thus more dummy patterns are inserted in consideration of a configuration and orientation of the main pattern on respective metal layers to raise pattern density. Moreover, the dummy patterns are formed in the same direction as the main patterns to raise uniformity of the patterns and to maintain the CD (Critical Diameter) of each pattern constant by securing the uniformity of the patterns as well as to simplify designing and manufacturing process by the regularity of the orientation of the dummy pattern relative to the main pattern.

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