发明名称 Semiconductors with lowered contact facecharge
摘要 <p>Semiconductors are prepd. by placing layer of silicon oxide on the surface of a semiconductor substrate, placing a metal layer over the oxide layer, and placing a layer of silicon nitride over the metal layer. Pref. the metal layer consists of Al or Au, and a further metal layer of Al is placed over the nitride layer in line with the underlying metal layer. Gives semiconductors with a combination of silicon dioxide and silicon nitride passivation; which are comparable with bipolar integrated circuits. Esp. useful for the prodn. of field effect transistors.</p>
申请公布号 FR2077337(A7) 申请公布日期 1971.10.22
申请号 FR19710002496 申请日期 1971.01.26
申请人 ITT INDUSTRIES INC 发明人
分类号 H01L21/00;H01L23/29;H01L29/792;(IPC1-7):01L7/00;01L11/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址