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发明名称
导光板模仁制程
摘要
一种导光板模仁制程,主要是于一基板至少一表面形成有不连续的多数披覆区,再将该基板表面依时间差暴露于蚀刻源中,使该基板表面或披覆区依据与蚀刻源接触时间的长短,形成具有高度落差的多数凹部或多数凸部。藉此,以该模仁制成导光板及其表面具有深浅变化的多数网点,而能简化该模仁的制程,并节省工时。
申请公布号
TW200844484
申请公布日期
2008.11.16
申请号
TW096117043
申请日期
2007.05.14
申请人
国立中兴大学
发明人
韩斌;林明泽;郑武雄;陈伟哲;童麒嘉
分类号
G02B5/00(2006.01)
主分类号
G02B5/00(2006.01)
代理机构
代理人
恽轶群;陈文郎
主权项
地址
台中市南区国光路250号
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