| 摘要 |
A photosensitive insulative paste composition that can be developed in an alkaline developer or water and can be used to form a thick but still highly sensitive layer and, thus, high-precision patterns. The photosensitive insulative paste composition contains an organic component and an inorganic powder and the organic component comprises (A) a water-soluble cellulose derivative, (B) a hydroxyl-containing acrylic resin having a molecular weight of 20000 or less, (C) a photopolymerizable monomer, and (D) a photopolymerization initiator. |
