发明名称 METHOD AND APPARATUS FOR WORKPIECE SURFACE MODIFICATION FOR SELECTIVE MATERIAL DEPOSITION
摘要 Methods and apparatus are provided for selective modification of the surface of a workpiece (100). In some embodiments, using a workpiece-surface-influencing device (120) that preferentially contacts the top surface (130) of the workpiece (100), chemical modification of the top surface (130) is achieved on desired field areas (130) of the workpiece (100) without affecting the surfaces of cavities or recesses (132) in the field areas (130). The workpiece- surface-influencing device includes a substance (140) which is chemically reactive with material forming the surface (130) of the workpiece (100). The chemically active material (140 can be in the form of a thin film or coating which contacts the surface (130) of the workpiece (100) to chemically modify that surface. In some embodiments, the workpiece-surface- influencing device can be in the form of a solid state applicator such as a roller or a semi- permeable membrane.
申请公布号 WO2008027761(A3) 申请公布日期 2008.11.13
申请号 WO2007US76446 申请日期 2007.08.21
申请人 IPGRIP, LLC;VASILEV, VLADISLAV 发明人 VASILEV, VLADISLAV
分类号 H01L21/4763;H01L21/44 主分类号 H01L21/4763
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