发明名称 INVERTED JUNCTION FIELD EFFECT TRANSISTOR AND METHOD OF FORMING THEREOF
摘要 <p>A junction field effect transistor includes a substrate (12) and a well region (20) on the substrate (12). A channel region (22) lies in the well region (20). A source region (15) lies in the channel region (22). A drain region (13) lies in the channel region (22) and apart from the source region (15). A gate region (11) is isolated from the source, drain, and channel regions. The gate region (11) is in contact with a portion of the well region (20).</p>
申请公布号 WO2008137309(A1) 申请公布日期 2008.11.13
申请号 WO2008US61108 申请日期 2008.04.22
申请人 DSM SOLUTIONS, INC.;VORA, MADHU;KAPOOR, ASHOK, K. 发明人 VORA, MADHU;KAPOOR, ASHOK, K.
分类号 H01L29/808;H01L21/337;H01L29/10 主分类号 H01L29/808
代理机构 代理人
主权项
地址