| 摘要 |
The uniformity of plasma density in the housing is improved. Moreover, a deterioration of the plasma uniformity between the adjacent electromagnet can be prevented. The plasma processing apparatus comprises the housing having the space for accommodating substrate; the gas supply member for supplying the gas within the housing; the plasma source for generating the plasma from the gas supplied within the housing; and the magnetic field member for forming the magnetic field on the region in which the plasma is generated in the housing. The magnetic field member comprises the first magnetic unit disposed at the circumference of the housing(420), the second magnetic unit which is disposed at the circumference of the housing, divided into the first magnetic unit and layer(440).
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