发明名称 Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device
摘要 It is an object of the present invention to provide a laser irradiation apparatus, a laser irradiation method, and a method for manufacturing a semiconductor device using the laser irradiation method that can suppress the energy distribution of the laser beam. The present invention provides a laser irradiation apparatus including a laser oscillator oscillating a pulsed laser beam, a lens assembly having a plurality of optical systems, position control means for controlling the position of the lens assembly to select at least two from the plurality of optical systems in synchronization with oscillations of a plurality of pulses of the pulsed laser beam, wherein the selected plurality of optical systems forms a plurality of pulses with spatial energy distribution inverted or rotated.
申请公布号 US7450307(B2) 申请公布日期 2008.11.11
申请号 US20040915438 申请日期 2004.08.11
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA KOICHIRO;MORIWAKA TOMOAKI;YAMAMOTO YOSHIAKI
分类号 G02B27/10;H01L21/324;B23K26/06 主分类号 G02B27/10
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