| 摘要 |
In one embodiment, the invention provides a method for fabricating a microelectromechanical systemsdevice. The method comprises fabricating a first layer comprising a film havinga characteristic electromechanical response, and a characteristic opticalresponse, wherein the characteristic optical response is desirable and thecharacteristic electromechanical response is undesirable; and modifying thecharacteristic electromechanical response of the first layer by at least reducingcharge build up thereon during activation of the microelectromechanical systemsdevice. |
