发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can increase area efficiency. SOLUTION: The semiconductor device comprises a plurality of conductor regions formed in a predetermined layer, an insulation film region which is formed in an insulation layer above the predetermined layer and covers at least a region other than the plurality of conductor regions, and an interconnection for connection which is formed along the insulation film region and connects between the plurality of conductor regions. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008270472(A) 申请公布日期 2008.11.06
申请号 JP20070110483 申请日期 2007.04.19
申请人 ELPIDA MEMORY INC 发明人 OKUMA YOSHIYUKI
分类号 H01L21/82;H01L21/288;H01L21/3205;H01L21/822;H01L23/52;H01L27/04;H01L27/10 主分类号 H01L21/82
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