| 摘要 |
PROBLEM TO BE SOLVED: To provide an etchant composition for a conductive film which can efficiently etch a conductive film, which does not produce residues after etching, which can suppress foaming at etching, and which is excellent in terms of etching workability. SOLUTION: An aqueous solution containing oxalic acid, anionic surfactant which is a compound having a -SO<SB>3</SB>group in a molecule, and fluorochemical surfactant is used as an etchant (an etchant composition for a conductive film). One or two or more selected from naphthalene sulfonic acid formaldehyde condensate, phenolsulfonic acid formaldehyde condensate, and phenylphenol sulfonic acid formaldehyde condensate are used as the anionic surfactant which is the compound having the -SO<SB>3</SB>group in the molecule. One or two or more selected from fluorochemical nonionic surfactant and fluorochemical anionic surfactant are used as the fluorochemical surfactant. COPYRIGHT: (C)2009,JPO&INPIT
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