| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a gas barrier film having high transparency and high gas barrier property, which does not require the control of oxygen partial pressure in film formation and has a high productivity. SOLUTION: In the manufacturing method of the gas barrier film, an SiO<SB>x</SB>film is formed at least on one surface of a base material film by electron beam vapor deposition method (EB) under an environment introducing no reaction gas while using an SiO vapor deposition material, wherein the SiO vapor deposition material is sintered in the presence of oxygen. COPYRIGHT: (C)2009,JPO&INPIT
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