POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition with improved line edge roughness due to normal exposure and immersion exposure and excellent followability to water during immersion exposure, and a pattern forming method using the same.

SOLUTION: The positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound generating an acid in irradiation with active light or radiation; (C) a resin that contains neither fluorine nor silicon and has a repeating unit having the predetermined structure; and (D) a solvent, wherein each symbol represents a predetermined group or the like.

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