| 摘要 |
PROBLEM TO BE SOLVED: To disclose a system, a method and an apparatus for monitoring a rotation of a substrate during cleaning. SOLUTION: The invention may include a substrate cleaner employed to support and clean a substrate; a light source employed to provide a light beam having an optical path within the substrate cleaner; and an optical sensor, arranged along the optical path so as to receive the light beam from the light source so that the optical sensor is employed for detecting an orientation feature of the substrate, when the orientation feature traverses the optical path. The optical sensor includes an array of optical detectors. A large number of additional embodiments is disclosed. COPYRIGHT: (C)2009,JPO&INPIT |
