| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus that can stabilize a vacuum treatment condition and improve the quality of a substrate by efficiently capturing an adsorption gas such as H<SB>2</SB>O which is produced in the vicinity of the substrate during vacuum treatment. SOLUTION: This vacuum treatment apparatus includes a vacuum vessel, a target, a substrate, an evacuation pump, and a deposition shield plate which is detachable, is arranged so as to face to the target and includes a plurality of perforated metals having a getter on their rear faces. Thereby, the vacuum treatment apparatus makes the getter on the rear face of the deposition shield plate capture the adsorption gas such as H<SB>2</SB>O inside itself and can efficiently evacuate the inside. COPYRIGHT: (C)2009,JPO&INPIT
|
